Vacuum coating equipment

Specification and model

LD-6C20(A/B)

Remarks

Vacuum Chamber Inner Size

¢800-900×h800-900(mm)

The size can be increased or decreased±10% 

Effective coating space

¢700-800×h600-700(mm)

The size can be increased or decreased±10% 

Workpiece rotary frame

Rotation + revolution and rotation

Design according to the specific requirements

The layout of the  rotary frame

The top of Vacuum Chamber   downward install

lower ,

upward install, 

can instead

Quantity of the hanging rod

4 rotation+6-8 revolution and rotation

Can design according to the workpiece quantity

Rotary speed

0-5revolutions/minute(rotation)speed governor adjust

variable-frequency governor

The maximum size of the workpiece 

¢150-170×h550-650(mm)rotation

Hanger quantities and rotation radius

Application

Decorative coating

Workpiece material

Metal, glass, ceramics, plastics etc.

Almost all material

Film material

TiN, CrN, TiC, TiCN, etc.

Multilayer film,

Decorative film

Requirement of production space

5×7m

Leave the space of operation and maintenance

Requirement of capacitance

50Hz 380V 60KVA

Installed capacity  not practical power consumptive

Requirement of cooling water

3ton/hour circulating cooling water/ 25°C

Pollutant emission

none

None exhaust gas,

wastewater,

none scrap

Work noise

≤90decibel

Vacuum air pump

2X-70rough pump+2X-30maintain pump

Roots pump

ZJP-150

Can increase 

Diffusion pump

KT-400

Can replace molecular pump according to the requirement

Ultimate vacuum

Overmatch 6×10-4 Pa

Work vacuum

6.67×10-3 Pa

Exhaust speed

<20 minutes(atmosphere—work  vacuum)

Normal temperature

Pressure rising rate(leak rate)

≤0.35Pa/h

Vacuum chamber material

304stainless steel

Rotary frame material

6 dynamoelectric striking the arc   indirect cooling

When the equipment upgrades option

Target size

¢100×40(mm)

Selectable configuration

Magnetron sputtering target

2(direct cooling)

Sputtering target size

w100-150×h600-700(mm)

Grid bias power supply

20KW  20KHz Inverter power supply

High-end configuration option(Already contains)

magnetron sputtering power supply

25KW  40KHz intermediate frequency pulse power source

Two set

Voltaic arc power supply

6  0-200A electric current  tunable

When the equipment upgrades option

Vacuum chamber heating power

15-18KW temperature PID adjust

Control mode

Automatic(A)

Manually operation(B)

Automatic control type have hand control

Automatic control system (A)

Industry control        computer+ PLD+ LCD+ printer

Can control by touch screen